Researches on the dependence between processing conditions and some tribological properties of TI-SI-C thin films

被引:0
作者
Munteanu, Daniel [1 ]
Vaz, F. [2 ]
Lopes, C. [2 ]
Carvalho, S. [2 ]
Veteleanu, Ana [1 ]
Borcea, B. [1 ]
Ionescu, C. [1 ]
Munteanu, A. [1 ]
机构
[1] TRANSILVANIA Univ Brasov, Brasov, Romania
[2] Univ Minho, Dept Fis, P-4800058 Guimaraes, Portugal
来源
METALURGIA INTERNATIONAL | 2008年 / 13卷 / 02期
关键词
titanium; silicon; carbide; coating; sputtering; composition; tribology;
D O I
暂无
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Ti-Si-C thin-films were prepared by d.c.reactive magneron sputtered on (AISIS M2) steel sample, at 200 degrees C. The depositions were carried out from Ti targets, one with some Si and the other with C pieces incrusted in the erosion zone, working in a simultaneously mode, under the variation of d.c. power applied to the targets. During the deposition process, all the samples were based with a bias voltage of -70V. The atomic composition of a deposited samples was measured by electron probe microanalsis (EPMA) in a Cameca SX-50 apparatus. A tribological characterization for the prepared thin-filims has been done, taking into account the differen measurement of roughness, static friction coefficient and wear. The results revealed that there is no clear correlation between the tribological paramenters, and the general wear behaviour could be explained considering the films composition. Thus, the best results were registered for C/Si ratio (at.%) between 2.2- 5.2, corresponding to a current ration I-Tic/I-TiSi(A) between 1.4-2.9.
引用
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页码:51 / 56
页数:6
相关论文
共 12 条
  • [1] Barsoum MW, 2001, AM SCI, V89, P334, DOI 10.1511/2001.4.334
  • [2] Ti-Si-C sputter deposited thin film coatings
    Gulbinski, W
    Gilewicz, A
    Suszko, T
    Warcholinski, B
    Kuklinski, Z
    [J]. SURFACE & COATINGS TECHNOLOGY, 2004, 180 : 341 - 346
  • [3] Tribological properties of silver- and copper-doped transition metal oxide coatings
    Gulbinski, W
    Suszko, T
    Sienicki, W
    Warcholinski, B
    [J]. WEAR, 2003, 254 (1-2) : 129 - 135
  • [4] HITERMANN H, 1986, VAPOUR DEPOSITED WEA, P109
  • [5] KONTZAKI SH, 2001, J VAC SCI TECHNOL A, V19, P1912
  • [6] KRAZANOVSKI J, 2005, METTALURGICAL MAT A, V36, P32
  • [7] MUNTEANU D, 2002, P 3 C COAT SECT TRIB, P493
  • [8] Magnetron sputtered epitaxial single-phase Ti3SiC2 thin films
    Palmquist, JP
    Jansson, U
    Seppänen, T
    Persson, POÅ
    Birch, J
    Hultman, L
    Isberg, P
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (05) : 835 - 837
  • [9] PALMQUIST JP, 2002, AM I PHYS, V46
  • [10] Structural and mechanical properties of TiC and Ti-Si-C films deposited by pulsed laser deposition
    Phani, AR
    Krzanowski, JE
    Nainaparampil, JJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05): : 2252 - 2258