Uncovering the density of nanowire surface trap states hidden in the transient photoconductance

被引:13
作者
Xu, Qiang [1 ]
Dan, Yaping [1 ]
机构
[1] Shanghai Jiao Tong Univ, Univ Michigan Shanghai Jiao Tong Univ Joint Inst, Shanghai 200240, Peoples R China
基金
美国国家科学基金会;
关键词
SILICON NANOWIRES; PHOTODETECTORS;
D O I
10.1039/c6nr05014j
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The gain of nanoscale photoconductors is closely correlated with surface trap states. Mapping out the density of surface trap states in the semiconductor bandgap is crucial for engineering the performance of nanoscale photoconductors. Traditional capacitive techniques for the measurement of surface trap states are not readily applicable to nanoscale devices. Here, we demonstrate a simple technique to extract the information on the density of surface trap states hidden in the transient photoconductance that is widely observed. With this method, we found that the density of surface trap states of a single silicon nanowire is similar to 10(12) cm(-2) eV(-1) around the middle of the upper half bandgap.
引用
收藏
页码:15934 / 15938
页数:5
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