Characterization of a magnetron plasma for deposition of titanium oxide and titanium nitride films

被引：29

作者：

Hippler, R

Wrehde, S

Stranák, V

Zhigalov, O

Steffen, H

Tichy, M

Quaas, M

Wulff, H

机构：

[1] Ernst Moritz Arndt Univ Greifswald, Inst Phys, D-17489 Greifswald, Germany

[2] Univ S Bohemia, Dept Phys, Ceske Budejovice 37115, Czech Republic

[3] Charles Univ Prague, Fac Math & Phys, CR-18000 Prague, Czech Republic

[4] Ernst Moritz Arndt Univ Greifswald, Inst Biochem & Chem, D-17489 Greifswald, Germany

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 2005年 / 45卷 / 5-6期

关键词：

film deposition; magnetron sputtering; titanium oxide and nitride;

D O I：

10.1002/ctpp.200510040

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Experimental results for the energy distribution of electrons and plasma ions in a magnetron discharge with a titanium target and with pure argon, argon/nitrogen and argon/oxygen mixtures as working gas are reported. Typical electron temperatures measured 6.5....9.5 cm above the magnetron target range between 2-3.5 eV. Typical values for the plasma potential are in the 0.4-2 V range, as are mean ion energies measured with the help of energy-resolved mass spectrometry. Deposited titanium films show some dependencies on oxygen flow and on substrate bias. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：348 / 357

页数：10

共 11 条

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