The paper presents three datasets obtained by electrochemical quartz microbalance technique which was applied to studies of conducting polymer film in contact with non-aqueous electrolyte solution. The first dataset describes the calibration procedure of gold-coated quartz crystal, immersed in acetonitrile silver ioncontaining electrolyte, by means of silver layer electrodeposition. On the basis of experimentally measured dependence of the resonance frequency on the varying electrode mass in the course of electrochemical silver deposition/dissolution, the calibration coefficient was found to be equal to 13.6 ng/Hz. The second dataset has been collected when thus calibrated EQCM cell was used for determination of the mass change due to the polypyrrole film growth during anodic oxidation of pyrrole monomer from its acetonitrile solution. Its treatment reveals the proportionality between the mass change and the charge spent for pyrrole electrooxidation, the proportionality coefficient being 53.5 g per mole of electrons. The third dataset contains EQCM measurement data during repetitive charge-discharge treatment of the deposited polypyrrole film (cyclic voltammetry, CV) in monomer-free electrolyte. Collected data shows that continuous cycling of the polymer film leads to progressive increase of the cation-exchange contribution to the total ion flux which maintains the film's electroneutrality during variation of its redox state. These findings might be useful both for a qualitative consideration of the cycling stability of polypyrrole in non-aqueous medium and for a quantitative mathematical modelling of polypyrrole electropolymerization and its redox transformations. (c) 2020 The Author(s). Published by Elsevier Inc. This is an open access article under the CC BY license (http://creativecommons. org/licenses/by/4.0/).
机构:
Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
J.V.Thombare
S.K.Shinde
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
S.K.Shinde
G.M.Lohar
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
G.M.Lohar
U.M.Chougale
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
U.M.Chougale
S.S.Dhasade
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机构:Holography and Materials Research Laboratory,Department of Physics,Shivaji University
S.S.Dhasade
H.D.Dhaygude
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
H.D.Dhaygude
B.P.Relekar
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
B.P.Relekar
V.J.Fulari
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Holography and Materials Research Laboratory,Department of Physics,Shivaji UniversityHolography and Materials Research Laboratory,Department of Physics,Shivaji University
机构:
Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Bai, W.
Meng, X. J.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Meng, X. J.
Lin, T.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Lin, T.
Tian, L.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Tian, L.
Jing, C. B.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Qingdao Univ Sci & Technol, Coll Mat Sci & Technol, Qingdao 266042, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Jing, C. B.
Liu, W. J.
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E China Normal Univ, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200062, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Liu, W. J.
Ma, J. H.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Ma, J. H.
Sun, J. L.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
Sun, J. L.
Chu, J. H.
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Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
E China Normal Univ, Key Lab Polar Mat & Devices, Minist Educ, Shanghai 200062, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China