Strong bonding of titanium to copper through the elimination of the brittle interfacial intermetallics

被引:32
作者
Lee, M. K. [1 ]
Lee, J. G. [1 ]
Lee, J. K. [1 ]
Park, J. J. [1 ]
Lee, G. J. [1 ]
Uhm, Y. R. [1 ]
Rhee, C. K. [1 ]
机构
[1] Korea Atom Energy Res Inst, Nucl Mat Res Ctr, Taejon 305353, South Korea
关键词
D O I
10.1557/JMR.2008.0269
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructures, interfacial reactions, and bonding strength properties of the Ti-Cu dissimilar joints using a commercially available Ag-28Cu-2Ti filler were studied, particularly as they relate to the role of an Ag barrier layer at the Ti interface. A joint microstructure and interfacial reactions closely related to the formation of brittle interfacial Ti-Cu intermetallics were fully dominated by the presence of the Ag layer at the Ti interface. Reliable Ti(base)/TiAg/Ag/Ag-Cu eutectic/Cu(base) joints without any detrimental Ti-Cu intermetallics were achieved at low brazing temperatures below 810 degrees C by applying an Ag interlayer of suitable thickness. It was notable that their bonding strengths were strong enough to exceed the strength of a Cu bulk base metal. This research demonstrates the potential application of an Ag interlayer for the reliable Ti-Cu dissimilar joints.
引用
收藏
页码:2254 / 2263
页数:10
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