Brosilow-Ziff model for the CO-NO surface reaction on disordered two- and three-dimensional substrates -: art. no. 016111

被引:13
作者
Cortés, J [1 ]
Valencia, E [1 ]
机构
[1] Univ Chile, Fac Ciencias Fis & Matemat, Santiago, Chile
来源
PHYSICAL REVIEW E | 2003年 / 68卷 / 01期
关键词
D O I
10.1103/PhysRevE.68.016111
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The Brosilow-Ziff model, which for a uniform lattice shows superficial poisoning by the "checkerboard mechanism" for simplified Langmuir-Hinshelwood kinetics of the reduction reaction of NO by CO, has been studied in the case of various disordered substrates: two-dimensional (2D) incipient percolation cluster, backbone, and diffusion-limited aggregate (2D) fractals, together with a deterministic fractal and a statistical substrate, both three-dimensional. Some additional effects such as diffusion, nearest-next-neighbor sites, and desorption are also considered. The systems were found to be nonreactive and pseudoreactive in all the cases which showed the checkerboard mechanism. Otherwise, a reactive zone (window) related directly to the geometric structure of the substrate is seen.
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页数:8
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