Broadening of the transmission range of dielectric/metal multilayer structures by using different metals

被引:28
作者
Mouchaal, Y. [1 ,5 ]
Louarn, G. [2 ]
Khelil, A. [5 ]
Morsli, M. [3 ]
Stephant, N. [2 ]
Bou, A. [4 ]
Abachi, T. [1 ]
Cattin, L. [2 ]
Makha, M. [1 ]
Torchio, P. [4 ]
Bernede, J. C. [1 ]
机构
[1] CNRS, UMR 6200, MOLTECH Anjou, F-44000 Nantes, France
[2] CNRS, UMR 6502, Inst Mat Jean Rouxel IMN, F-44322 Nantes 3, France
[3] Fac Sci & Tech, F-44000 Nantes, France
[4] Univ Aix Marseille 1, CNRS, UMR 7334, Inst Mat Microelect Nanosci Prov IM2NP,Serv 231, F-13397 Marseille 20, France
[5] Univ Oran, LPCM2E, Oran 31000, Algeria
关键词
Indium free transparent electrode; Vacuum deposition; Transmission; Multi-layer structures; Metal bilayer; TRANSPARENT ELECTRODES; BUFFER LAYER; INDIUM; COPPER; FILMS; DEPOSITION;
D O I
10.1016/j.vacuum.2014.09.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnS/M-12/ZnS structures, with M-12 = Ag, Cu or Cu/Ag, were deposited under vacuum by simple joule heating effect (sublimation or evaporation). The optimum thicknesses of the different layers were experimentally determined: 50/45 nm for ZnS, 11 nm for Ag, 16 nm for Cu and 3 nm/9 nm for Cu/Ag. The presence of the double metal Cu/Ag interlayer induces a significant broadening of the optical transmittance spectrum of these structures. The properties of the structures depend strongly on deposition rate of the different films. When the deposition rates of ZnS, Cu are 0.15 nm/s and 0.30 nm/s for Ag, the averaged transmission, between 400 nm and 1000 nm is 85% while the sheet resistance is 5.0 +/- 0.2 Omega/sq. These performances allow achieving an averaged factor of merit Phi(M), between 400 nm and 700 nm, of 70 x 10(-3) Omega(-1). This averaged value tends toward those usually achieved by transparent conductive oxides. (C) 2014 Elsevier Ltd. All rights reserved.
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页码:32 / 41
页数:10
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