Advances in the Pulsed Laser Deposition of Rare Earth - Doped LiYF4 Thin Films on LiYF4 Substrates

被引：0
作者：
Anwar-ul-Haq, M. [1 ]
Barsanti, S. [1 ]
机构：
[1] Univ Siena, Dept Phys, Via Roma 56, I-53100 Siena, Italy
来源：
2009 9TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO) | 2009年
关键词：
Pulsed laser deposition; thin films; fluoride crystals; FLUORIDE; ABSORPTION; TM3+;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The influence of several experimental ablation/deposition parameters on the pulsed laser deposition on mono-crystalline LiYF4 substrates of Nd3+:LiYF4 thin films with suitable characteristics for their use as active medium in micro-lasers is investigated. The very first realization with the same technique of a Tm3+:LiYF4 thin film on mono-crystalline LiYF4 substrate is reported together with the first spectroscopic analysis of its optical properties.
引用
收藏
页码：313 / 316
页数：4
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