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Advances in the Pulsed Laser Deposition of Rare Earth - Doped LiYF4 Thin Films on LiYF4 Substrates
被引:0
|作者:
Anwar-ul-Haq, M.
[1
]
Barsanti, S.
[1
]
机构:
[1] Univ Siena, Dept Phys, Via Roma 56, I-53100 Siena, Italy
来源:
2009 9TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)
|
2009年
关键词:
Pulsed laser deposition;
thin films;
fluoride crystals;
FLUORIDE;
ABSORPTION;
TM3+;
D O I:
暂无
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The influence of several experimental ablation/deposition parameters on the pulsed laser deposition on mono-crystalline LiYF4 substrates of Nd3+:LiYF4 thin films with suitable characteristics for their use as active medium in micro-lasers is investigated. The very first realization with the same technique of a Tm3+:LiYF4 thin film on mono-crystalline LiYF4 substrate is reported together with the first spectroscopic analysis of its optical properties.
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页码:313 / 316
页数:4
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