Giant microwave photoresistance of two-dimensional electron gas

被引：204

作者：

Ye, PD ^{[1
]}

Engel, LW

Tsui, DC

Simmons, JA

Wendt, JR

Vawter, GA

Reno, JL

机构：

[1] Natl High Magnet Field Lab, Tallahassee, FL 32310 USA

[2] Princeton Univ, Dept Elect Engn, Princeton, NJ 08544 USA

[3] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 14期

关键词：

D O I：

10.1063/1.1408910

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We measure microwave frequency (4-40 GHz) photoresistance at low magnetic field B, in high mobility two-dimensional electron gas samples, excited by signals applied to a transmission line fabricated on the sample surface. Oscillatory photoresistance vs B is observed. For excitation at the cyclotron resonance frequency, we find a giant relative photoresistance DeltaR/R of up to 250%. The photoresistance is apparently proportional to the square root of applied power, and disappears as the temperature is increased. (C) 2001 American Institute of Physics.

引用

页码：2193 / 2195

页数：3

共 9 条

[1]

DU RR, IN PRESS PHYS REV B

[2] MICROWAVE FREQUENCY-DEPENDENCE OF INTEGER QUANTUM HALL-EFFECT - EVIDENCE FOR FINITE-FREQUENCY SCALING [J].