Strain-induced formation of self-assembled InGaN/GaN superlattices in nominal InGaN films grown by plasma-assisted molecular beam epitaxy

被引:6
作者
Khan, Kamruzzaman [1 ]
Sun, Kai [1 ]
Wurm, Christian [2 ]
Datta, Kanak [3 ]
Deotare, Parag B. [3 ,4 ]
Ahmadi, Elaheh [3 ,4 ]
机构
[1] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[2] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[3] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
[4] Univ Michigan, Appl Phys Program, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
TIME-RESOLVED PHOTOLUMINESCENCE; INTERNAL ELECTRIC-FIELD; LIGHT-EMITTING-DIODES; QUANTUM-WELL; CRITICAL THICKNESS; PHASE-SEPARATION; LASER-DIODES; LIFETIME; DISLOCATIONS; LEDS;
D O I
10.1103/PhysRevMaterials.5.124606
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, we report the spontaneous formation of superlattice structures in nominal InGaN films grown by plasma-assisted molecular beam epitaxy. A 700-nm-thick self-assembled In0.2Ga0.8N/GaN superlattice with excellent structural quality was achieved. Strain was studied as a possible driving force for the formation of selfassembled superlattice (SASL) structure by growth of InGaN on ZnO substrate using similar growth conditions. The SASL structures were optically characterized using photoluminescence spectroscopy. Structural characterization was conducted via transmission electron microscopy and atom probe tomography. High-resolution x-ray diffraction (XRD) and XRD reciprocal space map were utilized to determine the average composition and the degree of relaxation of InGaN films. We propose that the vertical phase separation observed in the SASL structure is caused by high-temperature growth and intensified by strain. This work provides a method for engineering strain and growth of thick InGaN films for a variety of applications including solar cells and photodetectors.
引用
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页数:8
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