The barrier height inhomogeneity in identically prepared Au/n-GaAs Schottky barrier diodes

被引:73
|
作者
Leroy, WP
Opsomer, K
Forment, S
Van Meirhaeghe, RL
机构
[1] State Univ Ghent, Vakgroep Vaste Sofwetenschappen, B-9000 Ghent, Belgium
[2] Katholieke Univ Leuven, EE Dept, IMEC, B-3001 Louvain, Belgium
关键词
Schottky barrier height inhomogeneities; conducting probe-AFM; GaAs;
D O I
10.1016/j.sse.2005.03.005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have prepared small Au/n-GaAs Schottky barrier diodes (SBDs) using e-beam lithography (EBL), and obtained their effective barrier heights (BHs) and ideality factors from current-voltage (I/V) characteristics, which were measured using a conducting probe atomic force microscope (CP-AFM). Although the diodes were all identically prepared, there was a diode-to-diode variation: the effective BHs ranged from 0.795 eV to 0.836 eV, and the ideality factor from 1.025 to 1.101. Lateral homogeneous BHs were computed from the observed linear correlation between BH and ideality factor using the method of Schmitsdorf et al. [Schmitsdorf RF, Kampen TU, Monch W. J Vac Sci Technol B 1997;15(4):1221]. These homogeneous BHs were also obtained from the fit to the experimental I/V characteristics of the current through a "patchy" diode. From our model, the barrier height in the patches and their diameter could be determined. It are however the homogeneous BHs which should be used to make theories of the physical mechanisms responsible for the Schottky barrier height of the metal-semiconductor combination considered. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:878 / 883
页数:6
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