Multi-scaling of the dense plasma focus

被引:2
|
作者
Saw, S. H. [1 ,2 ]
Lee, S. [1 ,2 ,3 ]
机构
[1] INTI Int Univ, Nilai 71800, Negeri Sembilan, Malaysia
[2] Inst Plasma Focus Studies, Melbourne, Vic, Australia
[3] Univ Malaya, Kuala Lumpur, Malaysia
关键词
X-RAY-LITHOGRAPHY; NUMERICAL EXPERIMENTS; NEUTRON YIELD; NEON; EMISSION; DYNAMICS; PINCH; MODEL;
D O I
10.1088/1742-6596/591/1/012022
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The dense plasma focus is a copious source of multi-radiations with many potential new applications of special interest such as in advanced SXR lithography, materials synthesizing and testing, medical isotopes and imaging. This paper reviews the series of numerical experiments conducted using the Lee model code to obtain the scaling laws of the multi-radiations.
引用
收藏
页数:11
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