Effect of different n-electrode patterns on optical characteristics of large-area p-side down InGaN light-emitting diodes fabricated by laser lift-off

被引:0
作者
Chu, JT [1 ]
Liang, WD [1 ]
Kao, CC [1 ]
Huang, HW [1 ]
Chu, CF [1 ]
Kuo, HC [1 ]
Wang, SC [1 ]
机构
[1] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu, Taiwan
来源
Light-Emitting Diodes: Research, Manufacturing, and Applications IX | 2005年 / 5739卷
关键词
GaN LEDs; laser lift-off (LLO); wafer bonding; large-area light-emitting LEDs;
D O I
10.1117/12.583288
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Large-area (1000x1000 gm) p-side down InGaN light-emitting diodes (LEDs) have been fabricated by laser lift-off (LLO) technique. The p-side down LEDs with different geometric patterns of n-electrode were fabricated to investigate electrode pattern-dependent optical characteristics. Current crowding effect was first observed in in the p-side down InGaN LLO-LEDs. The LEDs with well designed n-electrode shows a uniform distribution of light-emitting pattern and higher out put power due to uniform current spreading and minimization of thermal effect. The output power saturation induced by current crowding in the LEDs with simplest geometric n-electrode was demonstrated. In absent of transparent contact layer for current spreading, the n-electrode pattern has remarkable influence on the current distribution and consequently the light output power of the large-area p-side down LEDs.
引用
收藏
页码:122 / 128
页数:7
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