Effect of the surface roughness on the impedance spectrum of a tellurium electrode

被引:2
作者
Abakarov, MA [1 ]
Giraev, MA [1 ]
Shabanov, OM [1 ]
机构
[1] Dagestan State Univ, Makhachkala, Russia
关键词
tellurium; semiconductor; etching; impedance; spectrum;
D O I
10.1007/s11175-005-0172-2
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The effect of the electrode surface treatment on the frequency dispersion of the linear impedance of the Te-H2SO4 heterosystem is studied. The frequency dependence of impedance Z is determined by the tellurium surface treatment (mechanical polishing, chemical etching). The main variations of Z(f) occur at relatively low frequencies. The etching kinetics of single-crystal tellurium is considered.
引用
收藏
页码:1017 / 1019
页数:3
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