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Impact of edge states on device performance of phosphorene heterojunction tunneling field effect transistors
被引:20
作者:
Liu, Fei
[1
,2
]
Wang, Jian
[1
]
Guo, Hong
[2
,3
]
机构:
[1] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[2] McGill Univ, Dept Phys, 3600 Univ St, Montreal, PQ H3A 2T8, Canada
[3] Shenzhen Univ, Sch Phys & Energy, Shenzhen 518060, Peoples R China
来源:
基金:
加拿大自然科学与工程研究理事会;
中国国家自然科学基金;
关键词:
BLACK PHOSPHORUS;
D O I:
10.1039/c6nr05734a
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Black phosphorus (BP) tunneling field effect transistors (TFETs) using heterojunctions (Hes) are investigated by atomistic quantum transport simulations. It is observed that edge states have a great impact on the transport characteristics of BP He-TFETs, which results in the potential pinning effect and deterioration of gate control. However, the on-state current can be effectively enhanced by using hydrogen to saturate the edge dangling bonds in BP He-TFETs, by which means edge states are quenched. By extending layered BP with a smaller band gap to the channel region and modulating the BP thickness, the device performance of BP He-TFETs can be further optimized and can fulfil the requirements of the international technology road-map for semiconductors (ITRS) 2013 for low power applications. In 15 nm 3L-1L and 4L-1L BP He-TFETs along the armchair direction the on-state currents are over two times larger than the current required by ITRS 2013 and can reach above 10(3) mu A mu m(-1) with the fixed off-state current of 10 pA mu m-1. It is also found that the ambipolar effect can be effectively suppressed in BP He-TFETs.
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页码:18180 / 18186
页数:7
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