An industrial risk-based indicator for dynamic sampling in semiconductor manufacturing

被引:0
作者
Korabi, Taki Eddine [1 ,2 ]
Graton, Guillaume [2 ,3 ]
El Adel, El Mostafa [2 ]
Ouladsine, Mustapha [2 ]
Pinaton, Jacques [1 ]
机构
[1] ST Microelect Rousset, 190 Ave Celestin Coq, F-13106 Rousset, France
[2] Univ Toulon & Var, Aix Marseille Univ, CNRS, ENSAM,LIS,UMR 7020, Ave Escadrille Normandie Niemen, F-13397 Marseille 20, France
[3] Ecole Cent Marseille, Technopole Chateau Gombert,38 Rue Frederic Joliot, F-13451 Marseille 13, France
来源
2018 UKACC 12TH INTERNATIONAL CONFERENCE ON CONTROL (CONTROL) | 2018年
关键词
Run-to-Run control; Dynamic sampling; Industrial risk; Bayesian detection; PERFORMANCE ASSESSMENT; RUN;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Uniform rate sampling is the easiest and most common sampling strategy used in the semiconductor industry. It consists of measuring every N products and is used for both regulated and unregulated steps. However, it is well-know that the sampling frequency has a direct impact on regulator performances making uniform rate sampling ineffective with the regulated steps. This paper proposes an indicator allowing the adaptation of the sampling frequencies taking into account the performances of the regulator and the industrial risk. The developed method offers better regulation performances, less measured products and leads to yield improvement and cycle time reduction. The approach is tested with real data provided by STMicroelectronics.
引用
收藏
页码:230 / 235
页数:6
相关论文
共 13 条
[1]  
[Anonymous], 1997, Stat. Comput., DOI DOI 10.1023/A:1018577817064
[2]   Run-to-run control and performance monitoring of overlay in semiconductor manufacturing [J].
Bode, CA ;
Ko, BS ;
Edgar, TF .
CONTROL ENGINEERING PRACTICE, 2004, 12 (07) :893-900
[3]  
Boning D. S., 1996, IEEE Transactions on Components, Packaging & Manufacturing Technology, Part C (Manufacturing), V19, P307, DOI 10.1109/3476.558560
[4]   Run-to-run process control: Literature review and extensions [J].
DelCastillo, E ;
Hurwitz, AM .
JOURNAL OF QUALITY TECHNOLOGY, 1997, 29 (02) :184-196
[5]  
Diebold A.C., 2001, Handbook of silicon semiconductor metrology
[6]   Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities [J].
Edgar, TF ;
Butler, SW ;
Campbell, WJ ;
Pfeiffer, C ;
Bode, C ;
Hwang, SB ;
Balakrishnan, KS ;
Hahn, J .
AUTOMATICA, 2000, 36 (11) :1567-1603
[7]  
May G.S., 2006, Fundamentals of Semiconductor Manufacturing and Process Control, P25, DOI DOI 10.1002/0471790281.CH2
[8]  
Moyne J., 2001, RUN TO RUN CONTROL S, V200
[9]   A Literature Review on Sampling Techniques in Semiconductor Manufacturing [J].
Nduhura-Munga, Justin ;
Rodriguez-Verjan, Gloria ;
Dauzere-Peres, Stephane ;
Yugma, Claude ;
Vialletelle, Philippe ;
Pinaton, Jacques .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2013, 26 (02) :188-195
[10]   Performance assessment of run-to-run EWMA controllers [J].
Prabhu, Amogh V. ;
Edgar, Thomas F. .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2007, 20 (04) :381-385