Ta-Zr-N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering

被引：8

作者：

Chang, Li-Chun ^{[1
,2
]}

Chang, Ching-Yen ^{[1
]}

You, Ya-Wen ^{[1
]}

机构：

[1] Ming Chi Univ Technol, Dept Mat Engn, New Taipei 24301, Taiwan

[2] Ming Chi Univ Technol, Ctr Thin Film Technol & Applicat, New Taipei 24301, Taiwan

来源：

COATINGS | 2017年 / 7卷 / 11期

关键词：

annealing; HIPIMS; mechanical properties; oxidation resistance; HARD NANOCOMPOSITE COATINGS; MECHANICAL-PROPERTIES; OXIDATION RESISTANCE; THERMAL-STABILITY; MODULUS; TI;

D O I：

10.3390/coatings7110189

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ta-Zr-N thin films were fabricated through co-deposition of radio-frequency magnetron sputtering and high-power impulse magnetron sputtering (HIPIMS/RFMS co-sputtering). The oxidation resistance of the fabricated films was evaluated by annealing the samples in a 15-ppm O-2-N-2 atmosphere at 600 degrees C for 4 and 8 h. The mechanical properties and surface roughness of the as-deposited and annealed thin films were evaluated. The results indicated that the HIPIMS/RFMS co-sputtered Ta-Zr-N thin films exhibited superior mechanical properties and lower surface roughness than did the conventional direct current-sputtered Ta-Zr-N thin films and HIPIMS-fabricated ZrNx thin films in both the as-deposited and annealed states.

引用

页数：10

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