Silicon Wafers with Facet-Dependent Electrical Conductivity Properties

被引:48
作者
Tan, Chih-Shan [1 ]
Hsieh, Pei-Lun [2 ]
Chen, Lih-Juann [2 ]
Huang, Michael H. [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Chem, Hsinchu 30013, Taiwan
[2] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
关键词
band bending; electrical conductivity; facet-dependent properties; field-effect transistors; silicon; PHOTOCATALYTIC PROPERTIES; CU2O CRYSTALS; ENERGY-CONVERSION; NANOCRYSTALS; TIO2; ORIENTATION; OCTAHEDRA; NANOCUBES;
D O I
10.1002/anie.201709020
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
By breaking intrinsic Si (100) and (111) wafers to expose sharp {111} and {112} facets, electrical conductivity measurements on single and different silicon crystal faces were performed through contacts with two tungsten probes. While Si {100} and {110} faces are barely conductive at low applied voltages, as expected, the Si {112} surface is highly conductive and Si {111} surface also shows good conductivity. Asymmetrical I-V curves have been recorded for the {111}/{112}, {111}/{110}, and {112}/{110} facet combinations because of different degrees of conduction band bending at these crystal surfaces presenting different barrier heights to current flow. In particular, the {111}/{110} and {112}/{110} facet combinations give I-V curves resembling those of p-n junctions, suggesting a novel field effect transistor design is possible capitalizing on the pronounced facet-dependent electrical conductivity properties of silicon.
引用
收藏
页码:15339 / 15343
页数:5
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