View of the empty states of the Si(100)-(2x1) surface via scanning tunneling microscopy imaging at very low biases

被引:42
|
作者
Qin, XR [1 ]
Lagally, MG [1 ]
机构
[1] Univ Wisconsin, Madison, WI 53706 USA
来源
PHYSICAL REVIEW B | 1999年 / 59卷 / 11期
关键词
D O I
10.1103/PhysRevB.59.7293
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It is shown that the use of very-low-bias voltages in scanning tunneling microscopy of the Si(100)-2 x 1 surface achieves significantly greater sensitivity to the electronic states of the top atomic layer than does the use of typical larger bias voltages. Measurements with the increased sensitivity demonstrate that the conventional interpretation of empty-state images of Si(100) is inadequate,New spectroscopic assignments for observed features are proposed. [S0163-1829(99)05708-2].
引用
收藏
页码:7293 / 7296
页数:4
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