Electron-beam lithography

被引：0

作者：

Harriott, L

Liddle, A

机构：

来源：

PHYSICS WORLD | 1997年 / 10卷 / 04期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：41 / 45

页数：5

共 9 条

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[5]

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[6] ELECTRON-BEAM CELL PROJECTION LITHOGRAPHY - A NEW HIGH-THROUGHPUT ELECTRON-BEAM DIRECT-WRITING TECHNOLOGY USING A SPECIALLY TAILORED SI APERTURE [J].

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[7] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY [J].

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[8]

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[9] DOUBLE-APERTURE METHOD OF PRODUCING VARIABLY SHAPED WRITING SPOTS FOR ELECTRON LITHOGRAPHY [J].

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