Photoinduced hydrophilicity of epitaxially grown TiO2 films by RF magnetron sputtering

被引:25
|
作者
Song, PK
Yamagishi, M
Odaka, H
Shigesato, Y
机构
[1] Aoyama Gakuin Univ, Sch Sci & Engn, Sagamihara, Kanagawa 2298558, Japan
[2] Asahi Glass Co Ltd, Res Ctr, Kanagawa Ku, Yokohama, Kanagawa 2210863, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 12B期
关键词
titanium dioxide; photocatalyst; hydrophilicity; epitaxial growth; sputtering;
D O I
10.1143/JJAP.42.L1529
中图分类号
O59 [应用物理学];
学科分类号
摘要
Titanium dioxide (TiO2) films were deposited by r.f. reactive magnetron sputtering on the following four different substrates, (a) nonalkali glass (Corning #7059), (b) MgO (100), (c) SrTiO3 (100) and (d) rutile (110), (001), (100), where (b)-(d) were single crystals. X-ray diffraction and pole figure analyses revealed that TiO2 films on a) were anatase polycrystals with (101) preferred orientation, whereas hetero- or homoepitaxial growth of anatase or rutile TiO2 was observed on the (b)-(d) substrates. The epitaxial relationships were as follows: (b) anatase, (100)[001]//MgO(100)[001], (c) anatase (001)[100]//SrTiO3(100)[001] and (d) rutile homoepitaxy. The heteroepitaxl anatase films with the thickness greater than 100 nm showed UV-induced super-hydrophilicity, where the water contact angle decreased to less than 1degrees.
引用
收藏
页码:L1529 / L1531
页数:3
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