Photoinduced hydrophilicity of epitaxially grown TiO2 films by RF magnetron sputtering

被引：25

作者：

Song, PK

Yamagishi, M

Odaka, H

Shigesato, Y

机构：

[1] Aoyama Gakuin Univ, Sch Sci & Engn, Sagamihara, Kanagawa 2298558, Japan

[2] Asahi Glass Co Ltd, Res Ctr, Kanagawa Ku, Yokohama, Kanagawa 2210863, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 12B期

关键词：

titanium dioxide; photocatalyst; hydrophilicity; epitaxial growth; sputtering;

D O I：

10.1143/JJAP.42.L1529

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Titanium dioxide (TiO2) films were deposited by r.f. reactive magnetron sputtering on the following four different substrates, (a) nonalkali glass (Corning #7059), (b) MgO (100), (c) SrTiO3 (100) and (d) rutile (110), (001), (100), where (b)-(d) were single crystals. X-ray diffraction and pole figure analyses revealed that TiO2 films on a) were anatase polycrystals with (101) preferred orientation, whereas hetero- or homoepitaxial growth of anatase or rutile TiO2 was observed on the (b)-(d) substrates. The epitaxial relationships were as follows: (b) anatase, (100)[001]//MgO(100)[001], (c) anatase (001)[100]//SrTiO3(100)[001] and (d) rutile homoepitaxy. The heteroepitaxl anatase films with the thickness greater than 100 nm showed UV-induced super-hydrophilicity, where the water contact angle decreased to less than 1degrees.

引用

页码：L1529 / L1531

页数：3