Effects of X-ray irradiation on optical property and defect relaxation in MeV ion-implanted MgO

被引：2

作者：

Ogiso, H ^{[1
]}

Nakano, S ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, AIST, Inst Mech Syst Engn, Tsukuba, Ibaraki 3058564, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 196卷 / 1-3期

关键词：

ion implantation; X-ray irradiation; defect restoring;

D O I：

10.1016/j.surfcoat.2004.08.078

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thermal annealing is usually used to restore defects in an ion-implanted layer as a posttreatment. This research proposes an X-ray irradiation method to restore defects, as well as thermal annealing. The advantages of this method are that low-melting temperature materials can be processed and that fine patterning can be achieved. To validate this method, MgO single crystal (100) was implanted with 3.1 MeV Au ions at a dose of 2 X 10(16) cm(-2) and then irradiated with X-rays. The results showed that the X-ray irradiation affected the optical absorption spectrum, the restoration of the defects, and the diffusion of the implanted atoms, which means that the effect of the X-ray irradiation is similar to thermal annealing. (c) 2004 Elsevier B.V. All rights reserved.

引用

页码：15 / 18

页数：4

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