Epitaxial lift-off of MBE grown II-VI heterostructures using a novel MgS release layer

被引:10
|
作者
Bradford, C [1 ]
Currran, A [1 ]
Balocchi, A [1 ]
Cavenett, BC [1 ]
Prior, KA [1 ]
Warburton, RJ [1 ]
机构
[1] Heriot Watt Univ, Sch Engn & Phys Sci, Edinburgh EH14 4AS, Midlothian, Scotland
关键词
etching; solubility; MBE; quantum wells; sulphides; semiconducting II-VI compounds;
D O I
10.1016/j.jcrysgro.2005.01.019
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxial Lift-Off of ZnSe/ZnCdSe and MgS/ZnCdSe quantum well structures from their GaAs substrate has been achieved by using highly reactive MgS as the sacrificial layer. This technique has proved possible in II-VI semiconductor materials due to the huge contrast in the etch rates between the metastable MgS release layer and the II-VI quantum well materials. In this paper, we outline the epitaxial lift-off technique used and confirm the success of the new method using photoluminescence experiments taken before and after lift-off. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:325 / 328
页数:4
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