Electrochemical deposition and microstructure of copper (I) oxide films

被引:96
作者
Zhou, YC
Switzer, JA
机构
[1] Chinese Acad Sci, Inst Met Res, Shenyang 110015, Peoples R China
[2] Univ Missouri, Dept Chem, Rolla, MO 65401 USA
[3] Univ Missouri, Grad Ctr Mat Res, Rolla, MO 65401 USA
基金
中国国家自然科学基金; 美国国家科学基金会;
关键词
D O I
10.1016/S1359-6462(98)00091-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
[No abstract available]
引用
收藏
页码:1731 / 1738
页数:8
相关论文
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