Initial stages of metal-organic chemical-vapor deposition of ZrO2 on a FeCrAl alloy

被引：4

作者：

Grehk, T. M. ^{[1
]}

Engkvist, J. ^{[1
]}

Bexell, U. ^{[1
]}

Richter, J. H. ^{[2
]}

Karlsson, P. G. ^{[2
]}

Sandell, A. ^{[2
]}

机构：

[1] Hgsk Dalarna, SE-78188 Borlange, Sweden

[2] Uppsala Univ, Dept Phys, SE-75121 Uppsala, Sweden

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 06期

关键词：

metal-organic chemical-vapor deposition (MOCVD); zirconium tetra-tert-butoxide (ZTB); zirconium oxide; FeCrAl-alloy; time of flight secondary ion mass spectrometry (ToF-SIMS); X-ray photoelectron spectroscopy (XPS); X-ray absorption spectroscopy (XAS);

D O I：

10.1016/j.tsf.2007.04.048

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The initial stages of metal-organic chemical-vapor deposition of ZrO2 on a model FeCrAl alloy was investigated using synchrotron radiation photoelectron spectroscopy, X-ray absorption spectroscopy, scanning Auger microprobe, and time of flight secondary mass spectrometry. The coatings were grown in ultra-high vacuum at 400 degrees C and 800 degrees C using the single source precursor zirconium tetra-tert-butoxide. At 400 degrees C the coatings mainly consist of tetragonal ZrO2 and at 800 degrees C a mixed ZrO2/Al2O3 layer is formed. The Al metal diffuses from the FeCrAl bulk to the metal/coating interface at 400 degrees C and to the surface of the coating at 800 degrees C. The result indicates that the reaction mechanism of the growth process is different at the two investigated temperatures. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：875 / 879

页数：5

共 11 条

[1]

Andersen J. N., 1991, SYNCHROTRON RAD NEWS, V4, P15

[2] Metal-oxide interaction for metal clusters on a metal-supported thin alumina film [J].