Key factors affecting contact resistance in coplanar organic thin-film transistors

被引:8
|
作者
Jo, Sun-Woo [1 ]
Cho, Seongjae [1 ]
Kim, Chang-Hyun [1 ]
机构
[1] Gachon Univ, Sch Elect Engn, Seongnam 13120, South Korea
基金
新加坡国家研究基金会;
关键词
organic thin-film transistors; device physics; numerical simulation; contact resistance; charge-carrier mobility; SEMICONDUCTORS; TRANSPORT; MODEL;
D O I
10.1088/1361-6463/ac8124
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a comprehensive numerical analysis of contact resistance in coplanar organic thin-film transistors. A large number of hole-transporting organic transistors are investigated through two-dimensional finite-element simulation, by deliberately changing the channel length, source/drain electrode thickness, and hole-injection energy barrier heights. Gate-field-dependent terminal contact resistances of these devices are fully estimated and electrostatic distributions inside the organic semiconductor film are visualized for the understanding of physical mechanisms. It is found that the relationship between source/drain electrode thickness and contact resistance does not follow any simple trend and is also strongly associated with the injection energy barrier. Moreover, the origin of negative contact resistance in organic transistors featuring a minimal charge-injection barrier is elaborated. Finally, a direct impact of the semiconductor charge-carrier mobility on contact resistance is addressed, revealing a linear dependence of contact resistance on inverse mobility over a broad parameter range.
引用
收藏
页数:7
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