Capping layers for extreme-ultraviolet multilayer interference coatings

被引:26
作者
Singh, M [1 ]
Braat, JJM [1 ]
机构
[1] Delft Univ Technol, Fac Sci Appl, Opt Res Grp, NL-2628 CJ Delft, Netherlands
关键词
D O I
10.1364/OL.26.000259
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The reflectivity of extreme-ultraviolet thin-film multilayer (ML) interference coatings, terminated by a native oxide or other capping layer (CL), is critically dependent on the thickness of the final deposited layer of the top period. We show in this numerical study that, for a molybdenum-silicon ML, a high reflectivity loss may be incurred if the final Si layer is not of optimum thickness: For maximum reflectivity the thickness of the final Si layer must be controlled such that the node of the standing wave lies within the absorptive CL. The final Si layer may be replaced, at the expense of reflectivity, by SiC and capped with another inert material for improved protection of the ML. (C) 2001 Optical Society of America.
引用
收藏
页码:259 / 261
页数:3
相关论文
共 8 条
[1]   Extreme ultraviolet lithography [J].
Gwyn, CW ;
Stulen, R ;
Sweeney, D ;
Attwood, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3142-3149
[2]   X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].
HENKE, BL ;
GULLIKSON, EM ;
DAVIS, JC .
ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) :181-342
[3]   Progress in Mo/Si multilayer coating technology for EUVL optics [J].
Louis, E ;
Yakshin, AE ;
Görts, PC ;
Oestreich, S ;
Stuik, R ;
Maas, ELG ;
Kessels, MJH ;
Bijkerk, F ;
Haidl, M ;
Müllender, S ;
Mertin, M ;
Schmitz, D ;
Scholze, F ;
Ulm, G .
EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :406-411
[4]  
MACLEOD HA, 1986, THIN FILM OPTICAL FI, P11
[5]   Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography [J].
Mirkarimi, PB ;
Bajt, S ;
Wall, MA .
APPLIED OPTICS, 2000, 39 (10) :1617-1625
[6]   Improved theoretical reflectivities of extreme ultraviolet mirrors [J].
Singh, M ;
Braat, JJM .
EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :412-419
[7]   Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity [J].
Singh, M ;
Braat, JJM .
APPLIED OPTICS, 2000, 39 (13) :2189-2197
[8]  
SPILLER E, 1994, SOFT XRAY OPTICS, pCH8