New designs for graded refractive index antireflection coatings

被引：54

作者：

Mahdjoub, A ^{[1
]}

Zighed, L ^{[1
]}

机构：

[1] Ctr Univ L Benmhidi, Dept Phys, OE Bouaghi 04000, Algeria

来源：

THIN SOLID FILMS | 2005年 / 478卷 / 1-2期

关键词：

ARCs; oxinitrides; ellipsometry; graded refractive index;

D O I：

10.1016/j.tsf.2004.11.119

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The incessant progress in thin layers technology, especially the graded index inhomogeneous dielectrics, allows the realization of antireflection coatings (ARCs). Graded refractive index silicon oxynitrides are deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) controlled in situ by monochromatic ellipsometry. While avoiding the complexity of the classical multilayer ARCs, graded coatings permit to obtain the same performances, or furthermore to improve solar cells efficiency. A theoretical model, validated by confrontation to ellipsometric spectra, and reflectance measurements were used to optimize different suggested profiles. Calculation predicts an enhancement of photogenerated current exceeding 45% and a weighted reflectance (between 300 and 1100 nm) around 5.6%. On texturized surfaces, these ARCs should enhance short-circuit current by 52.79%. (c) 2004 Elsevier B.V. All rights reserved.

引用

页码：299 / 304

页数：6

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