Temperature dependence of current-voltage characteristics of Ni-AlGaN/GaN Schottky diodes

被引:60
作者
Lim, Wantae [1 ]
Jeong, Jae-Hyun [1 ]
Lee, Jae-Hoon [1 ]
Hur, Seung-Bae [1 ]
Ryu, Jong-Kyu [1 ]
Kim, Ki-Se [1 ]
Kim, Tae-Hyung [2 ]
Song, Sang Yeob [2 ]
Yang, Jong-In [2 ]
Pearton, S. J. [3 ]
机构
[1] Samsung LED, GaN Power Res Grp, Suwon 443743, South Korea
[2] Samsung LED, R&D Team 1, Suwon 443743, South Korea
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
FIELD-EFFECT TRANSISTORS; GAN RECTIFIERS; PERFORMANCE; MECHANISMS; DENSITY; LEAKAGE;
D O I
10.1063/1.3525931
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ni-AlGaN/GaN Schottky barrier diodes (SBDs) with lateral geometry were fabricated on sapphire substrates. At 300 K, devices with 500-mu m-diameter Schottky contacts exhibited breakdown voltage (V(B)) of 765 V, forward current (I(F)) of 0.065 A at 1.5 V, and specific on-resistance (R(on)) of 81.3 m Omega cm(2), producing a figure-of-merit (V(B)(2)/R(on)) of similar to 7.2 MW cm(-2). Measured in multifinger patterns, the same parameters were 420 V, 3.2 A, 4.6 m Omega cm(2), and 38.4 MW cm(-2), respectively, at 300 K. With the increase in measurement temperature from 300 to 450 K, SBDs with dimensions of 3000 x 3000 mu m(2) showed larger effective barrier heights (0.8 eV at 300 K and 1.27 eV at 475 K) and a slightly negative temperature coefficient (-0.48 V K(-1)) for reverse breakdown voltage, while there was a little change in reverse leakage current. These results show the strong influence of barrier height inhomogeneity on the temperature dependence of apparent barrier heights obtained through current-voltage measurements. (C) 2010 American Institute of Physics. [doi:10.1063/1.3525931]
引用
收藏
页数:3
相关论文
共 23 条
[11]   Gate leakage current mechanisms in AlGaN/GaN heterostructure field-effect transistors [J].
Miller, EJ ;
Dang, XZ ;
Yu, ET .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (10) :5951-5958
[12]   AlGaN/GaN HEMTs - An overview of device operation and applications [J].
Mishra, UK ;
Parikh, P ;
Wu, YF .
PROCEEDINGS OF THE IEEE, 2002, 90 (06) :1022-1031
[13]   First AlGaN/GaN MOSFET with photoanodic gate dielectric [J].
Mistele, D ;
Rotter, T ;
Röver, KS ;
Paprotta, S ;
Seyboth, M ;
Schwegler, V ;
Fedler, F ;
Klausing, H ;
Semchinova, OK ;
Stemmer, J ;
Aderhold, J ;
Graul, J .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 93 (1-3) :107-111
[14]   Microwave noise performance of AlGaN-GaNHEMTs with small DC power dissipation [J].
Moon, JS ;
Micovic, M ;
Kurdoghlian, A ;
Janke, P ;
Hashimoto, P ;
Wong, WS ;
McCray, L ;
Nguyen, C .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (11) :637-639
[15]   On the temperature and carrier density dependence of electron saturation velocity in an AlGaN/GaN HEMT [J].
Oxley, CH ;
Uren, MJ ;
Coates, A ;
Hayes, DG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (03) :565-567
[16]   GaN: Processing, defects, and devices [J].
Pearton, SJ ;
Zolper, JC ;
Shul, RJ ;
Ren, F .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (01) :1-78
[17]   Current transport in Pt Schottky contacts to a-plane n-type GaN [J].
Phark, Soo-Hyon ;
Kim, Hogyoung ;
Song, Keun Man ;
Kang, Phil Geun ;
Shin, Heung Soo ;
Kim, Dong-Wook .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2010, 43 (16)
[18]   Analysis of the current-voltage characteristics of the Pd/Au Schottky structure on n-type GaN in a wide temperature range [J].
Ravinandan, M. ;
Rao, P. Koteswara ;
Reddy, V. Rajagopal .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2009, 24 (03)
[19]   Characterization of bulk GaN rectifiers for hydrogen gas sensing [J].
Voss, L ;
Gila, BP ;
Pearton, SJ ;
Wang, HT ;
Ren, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06) :2373-2377
[20]  
YOSHIDA S, 2006, P ISPSD