Preparation of CuInSe2 thin films on Mo-coated glass substrates by pulse-plated electrodeposition

被引:9
作者
Nomura, S [1 ]
Nishiyama, K [1 ]
Tanaka, K [1 ]
Sakakibara, M [1 ]
Ohtsubo, M [1 ]
Furutani, N [1 ]
Endo, S [1 ]
机构
[1] Sci Univ Tokyo, Fac Engn, Dept Elect Engn, Shinjuku Ku, Tokyo 162, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 6A期
关键词
CuInSe2; thin films; pulse-plated electrodeposition; Mo-coated glass substrates; duty cycle; annealing; X-ray diffraction; Raman spectra;
D O I
10.1143/JJAP.37.3232
中图分类号
O59 [应用物理学];
学科分类号
摘要
CuInSe2 thin films are prepared on Mo-coated glass substrates by pulse-plated electrodeposition from an aqueous solution including CuCl2, InCl3 and SeO2. Film deposition with a stoichiometric composition and a smooth surface has been achieved by the control of the applied pulses with a duty cycle theta of 33% and a cathode potential during on-time of -0.7V vs the saturated calomel electrode (SCE). The deposited films are annealed in nitrogen gas to be crystallized. The optimum annealing conditions have been determined using X-ray diffraction and Raman spectra measurement as: annealing temperature of 400 degrees C, and annealing duration of 90 min.
引用
收藏
页码:3232 / 3237
页数:6
相关论文
共 13 条
  • [1] CUINSE2 THIN-FILMS BY DC AND PULSE-PLATED ELECTRODEPOSITION
    BOUMERZOUG, M
    DAO, LH
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1990, 1 (03) : 123 - 128
  • [2] Endo S, 1996, JPN J APPL PHYS 2, V35, pL1101
  • [3] INVESTIGATIONS OF THE ELECTRICAL-PROPERTIES OF ELECTRODEPOSITED CUINSE2 THIN-FILMS
    GUILLEN, C
    HERRERO, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 71 (11) : 5479 - 5484
  • [4] *JCPDS, POWD DIFFR FIL, V37
  • [5] *JCPDS, POWD DIFFR FIL, V34
  • [6] *JCPDS, POWD DIFFR FIL, V6
  • [7] ELECTRODEPOSITION AND HEAT-TREATMENT OF CUINSE2 FILMS
    KHARE, N
    RAZZINI, G
    BICELLI, LP
    [J]. THIN SOLID FILMS, 1990, 186 (01) : 113 - 128
  • [8] LOKHANDDE CD, 1987, J ELECTROCHEM SOC, V134, P1728
  • [9] HOMOJUNCTION DIODE OF CUINSE2 THIN-FILM FABRICATED BY NITROGEN IMPLANTATION
    NISHITANI, M
    NEGAMI, T
    KOHIKI, S
    TERAUCHI, M
    WADA, T
    HIRAO, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (03) : 2067 - 2070
  • [10] CHARACTERIZATIONS OF ELECTRODEPOSITED CUINSE2 THIN-FILMS - STRUCTURE, DEPOSITION AND FORMATION MECHANISMS
    PERN, FJ
    NOUFI, R
    MASON, A
    FRANZ, A
    [J]. THIN SOLID FILMS, 1991, 202 (02) : 299 - 314