Theoretical analysis of scanning capacitance microscopy

被引:14
作者
Ruda, HE [1 ]
Shik, A [1 ]
机构
[1] Univ Toronto, Elect Mat Grp, Toronto, ON M5S 3E4, Canada
来源
PHYSICAL REVIEW B | 2003年 / 67卷 / 23期
关键词
D O I
10.1103/PhysRevB.67.235309
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A theoretical analysis of scanning capacitance microscopy is presented. By solving and matching the corresponding Laplace and Poisson equations for vacuum and semiconductor, the potential and charge distributions induced by a rounded tip in a semiconductor sample were found and used to calculate the capacity and its voltage derivative. The results allow us to analyze the dependence of the capacitance on the semiconductor doping level, applied voltage, and tip geometry, and to estimate the spatial resolution of such measurements.
引用
收藏
页数:7
相关论文
共 9 条
  • [1] Abramowitz M., 1970, HDB MATH FUNCTIONS
  • [2] Theory of scanning capacitance microscopy
    Balagurov, DB
    Klyuchnik, AV
    Lozovik, YE
    [J]. PHYSICS OF THE SOLID STATE, 2000, 42 (02) : 371 - 376
  • [3] Flammer C., 1957, SPHEROIDAL WAVE FUNC
  • [4] CAPACITANCE-VOLTAGE MEASUREMENT AND MODELING ON A NANOMETER-SCALE BY SCANNING C-V MICROSCOPY
    HUANG, Y
    WILLIAMS, CC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01): : 369 - 372
  • [5] Dopant profiling on semiconducting sample by scanning capacitance force microscopy
    Kobayashi, K
    Yamada, H
    Matsushige, K
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (14) : 2629 - 2631
  • [6] Scanning capacitance microscopy applied to two-dimensional dopant profiling of semiconductors
    Kopanski, JJ
    Marchiando, JF
    Lowney, JR
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 44 (1-3): : 46 - 51
  • [7] Model database for determining dopant profiles from scanning capacitance microscope measurements
    Marchiando, JF
    Kopanski, JJ
    Lowney, JR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01): : 463 - 470
  • [8] Quantitative measurement of two-dimensional dopant profile by cross-sectional scanning capacitance microscopy
    McMurray, JS
    Kim, J
    Williams, CC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04): : 1011 - 1014
  • [9] VONSPREKELSEN M, UNPUB