Growth and optical properties of SrBi2Nb2O9 ferroelectric thin films using pulsed laser deposition

被引:29
作者
Yang, PX [1 ]
Carroll, DL
Ballato, J
Schwartz, RW
机构
[1] Clemson Univ, Sch Mat Sci & Engn, Ctr Opt Mat Sci & Engn Technol, Clemson, SC 29634 USA
[2] Univ Missouri, Dept Ceram Engn, Rolla, MO 65409 USA
关键词
D O I
10.1063/1.1571219
中图分类号
O59 [应用物理学];
学科分类号
摘要
High quality SrBi2Nb2O9 ferroelectric thin films were fabricated on platinized silicon using pulsed laser deposition assisted with dc glow discharge plasma. Microstructure and ferroelectric properties of the films were characterized. Optical properties of the thin films were studied by spectroscopic ellipsometry and photoluminescence from the ultraviolet to the infrared region. Optical constants, n similar to 0.56 in the infrared region and n similar to 2.24 in the visible spectral region, were determined through multilayer analyses on their respective pseudodielectric functions. The band-gap energy is estimated to be 3.60 eV. A photoluminescence peak at 0.78 mum, whose intensity decreases with decreasing temperature, was observed when excited with subband-gap energy. (2.41 eV). This emission process may involve intermediate defect states at the crystallite boundaries. A possible mechanism for the observed photoluminescence, a Nb4+-O- exciton in the NbO6 octahedron, is discussed. (C) 2003 American Institute of Physics.
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收藏
页码:9226 / 9230
页数:5
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