UV imprinting for thin film solar cell application

被引：20

作者：

Escarre, J. ^{[1
]}

Battaglia, C. ^{[1
]}

Soederstroem, K. ^{[1
]}

Pahud, C. ^{[1
]}

Biron, R. ^{[1
]}

Cubero, O. ^{[1
]}

Haug, F-J ^{[1
]}

Ballif, C. ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne EPFL, Inst Microengn IMT, Photovolta & Thin Film Elect Lab, CH-2000 Neuchatel, Switzerland

来源：

JOURNAL OF OPTICS | 2012年 / 14卷 / 02期

基金：

瑞士国家科学基金会;

关键词：

solar cells; light trapping; UV imprinting; photovoltaics; thin film; plastic substrates; ZNO; LITHOGRAPHY;

D O I：

10.1088/2040-8978/14/2/024009

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

UV imprinting is an interesting, low cost technique to produce large area thin film solar cells incorporating nanometric textures. Here, we review and present new results confirming that replicas of the most common textures used in photovoltaics can be obtained by UV imprinting with an excellent fidelity. The use of these replicas as substrates for amorphous and micromorph thin film silicon solar cells is also shown, together with a comparison with devices obtained on the original textures.

引用

页数：8

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