Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse

被引：45

作者：

Tao, Y. ^{[1
]}

Tillack, M. S. ^{[1
]}

Sequoia, K. L. ^{[1
]}

Burdt, R. A. ^{[1
]}

Yuspeh, S. ^{[1
]}

Najmabadi, F. ^{[1
]}

机构：

[1] Univ Calif San Diego, Energy Res Ctr, San Diego, CA 92093 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 25期

关键词：

D O I：

10.1063/1.2951595

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of pulse duration on in-band (2% bandwidth) conversion efficiency (CE) from a CO2 laser to 13.5 nm extreme ultraviolet (EUV) light was investigated for Sn plasma. It was found that high in-band CE, 2.6%, is consistently obtained using a CO2 laser with pulse durations from 25 to 110 ns. Employing a long pulse, for example, 110 ns, in a CO2 laser system used in an EUV lithography source could make the system significantly more efficient, simpler, and cheaper as compared to that using a short pulse of 25 ns or shorter. (C) 2008 American Institute of Physics.

引用

页数：3

共 14 条

[1]

BRENDT DC, 2007, P SPIE, V6517

[2] DENSITY AND TEMPERATURE PROFILES IN STRONGLY ABSORBING PLASMA WITH DISTRIBUTED ABSORPTION [J].

DEGROOT, JS ;

CAMERON, SM ;

MIZUNO, K ;

ESTABROOK, KG ;

DRAKE, RP ;

KRUER, WL ;

YOUNG, PE .

PHYSICS OF FLUIDS B-PLASMA PHYSICS, 1991, 3 (05) :1241-1244

[3]

ENDO A, 2007, P SPIE, V6703

[4] Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas [J].

Fujioka, S ;

Nishimura, H ;

Nishihara, K ;

Sasaki, A ;

Sunahara, A ;

Okuno, T ;

Ueda, N ;

Ando, T ;

Tao, YZ ;

Shimada, Y ;

Hashimoto, K ;

Yamaura, M ;

Shigemori, K ;

Nakai, M ;

Nagai, K ;

Norimatsu, T ;

Nishikawa, T ;

Miyanaga, N ;

Izawa, Y ;

Mima, K .

PHYSICAL REVIEW LETTERS, 2005, 95 (23)

[5]

Kruer William, 2019, The physics of laser plasma interactions

[6] Extreme ultraviolet lithography: overview and development status [J].

Silverman, PJ .

JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (01) :1-5

[7] Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas -: art. no. 041503 [J].

Tanaka, H ;

Matsumoto, A ;

Akinaga, K ;

Takahashi, A ;

Okada, T .

APPLIED PHYSICS LETTERS, 2005, 87 (04)

[8] Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source [J].

Tao, Y. ;

Tillack, M. S. .

APPLIED PHYSICS LETTERS, 2006, 89 (11)

[9] Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source [J].

Tao, Y. ;

Tillack, M. S. ;

Harilal, S. S. ;

Sequoia, K. L. ;

Burdt, R. A. ;

Najmabadi, F. .

OPTICS LETTERS, 2007, 32 (10) :1338-1340

[10] Characterization of density profile of laser-produced Sn plasma for 13.5 nm extreme ultraviolet source [J].

Tao, Y ;

Nishimura, H ;

Fujioka, S ;

Sunahara, A ;

Nakai, M ;

Okuno, T ;

Ueda, N ;

Nishihara, K ;

Miyanaga, N ;

Izawa, Y .

APPLIED PHYSICS LETTERS, 2005, 86 (20) :1-3

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