Evaluation of wavefront aberrations induced by overlay errors in stitching computer-generated holograms

被引:3
作者
Bai, YingYing [1 ,2 ]
Zhang, ZhiYu [1 ]
Chen, TianBao [1 ,2 ]
Wang, RuoQiu [1 ]
Wei, HongDa [1 ]
Zeng, XueFeng [1 ]
Zhang, XueJun [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Opt Syst Adv Mfg Technol, Changchun 130033, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
Computer-generated hologram; Optical testing; Error analysis; ASPHERIC SURFACE; COMPENSATION; FABRICATION;
D O I
10.1016/j.optlaseng.2021.106944
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The emergence of large-aperture telescopes has fueled the need for testing and assisted alignment of large-scale optical systems. Computer-generated holograms (CGHs) have proven to be a useful method for aspheric optical testing and assisted alignment, and large-sized CGHs are required for large-scale aspherical systems. However, the maximum size of CGH is generally in the range of 6 to 9 inches owing to its current lithography capability. Stitching technology is a promising method for realizing larger-sized CGHs. As a proof of concept, a CGH with an aperture of 80 mm is fabricated using multistep lithography to investigate the overlay errors in stitching. Theoretical derivations reveal that additional tip/tilt aberrations are introduced owing to the overlay errors, which commonly couple with aberrations from adjustment errors. Therefore, to budget the effects of overlay errors, an evaluation method is proposed in this study. The evaluation results guide the separation and compensation of coupling aberrations in measurement. It is verified that the accuracy of a stitching CGH is considerably improved from 0.156 2 to 0.017 2 in terms of RMS after compensation. The findings obtained in this study during the development of stitching method and error evaluation are expected to promote the technology development and improvement of testing accuracy in stitching CGHs.
引用
收藏
页数:10
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