Extremely large magnetoresistance in boron-doped silicon

被引:91
作者
Schoonus, J. J. H. M. [1 ]
Bloom, F. L. [1 ]
Wagemans, W. [1 ]
Swagten, H. J. M. [1 ]
Koopmans, B. [1 ]
机构
[1] Univ Technol, Dept Appl Phys, Eindhoven, Netherlands
关键词
D O I
10.1103/PhysRevLett.100.127202
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Boron-doped Si-SiO2-Al structures are fabricated to study extremely large magnetoresistance (MR) effects. Current-voltage characteristics show a nonlinear behavior, dominated by an autocatalytic process of impact ionization. At low temperatures, the magnetic field postpones the onset of impact ionization to higher electric fields. This results in a symmetric positive MR of over 10 000% at 400 kA/m. Applying a magnetic field leads to an increase of the acceptor level compared to the valence band as deduced by admittance spectroscopy. A macroscopic transport model is introduced to describe how the MR is controlled by voltage, electrode spacing, and oxide thickness.
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页数:4
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