On the wear mechanism of thin nickel film during AFM-based scratching process using molecular dynamics

被引:23
|
作者
Khan, Hanif Muhammad [1 ]
Kim, Sung-Gaun [1 ]
机构
[1] Kongju Natl Univ, Div Mech & Automot Engn, Dept Mech & Automot Engn, Cheonan 331717, South Korea
关键词
AFM; Molecular dynamics; Nano scratching; NEMS; Nickel; Wear volume; EMBEDDED-ATOM-METHOD; SCALE; NANOINDENTATION; FRICTION; TRANSITION; SIMULATION; NI;
D O I
10.1007/s12206-011-0606-6
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
We report a study on monocrystalline nickel thin films using the atomic force microscope (AFM) based scratching process to understand the associated wear mechanism. As for the nano level fabrication, better understanding of abrasive wear mechanism is a prerequisite. A three-dimensional molecular dynamics (MD) study has been performed and we have used a new parameter wear volume to distinguish between different wear zones. A reduced number of zones have been proposed to understand the wear mechanism during nanoscratching process. Also, centrosymmetry parameter has been used to validate the findings.
引用
收藏
页码:2111 / 2120
页数:10
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