Electrodeposition and performance evaluation of high moment nickel-iron films

被引：0

作者：

Ramasubramanian, M ^{[1
]}

Lam, J ^{[1
]}

Hixson-Goldsmith, A ^{[1
]}

Medina, A ^{[1
]}

Dinan, T ^{[1
]}

Robertson, N ^{[1
]}

Harris, T ^{[1
]}

Yuan, S ^{[1
]}

机构：

[1] IBM Corp, Storage Technol Div, San Jose, CA USA

来源：

MAGNETIC MATERIALS, PROCESSES, AND DEVICES VII AND ELECTRODEPOSITION OF ALLOYS, PROCEEDINGS | 2003年 / 2002卷 / 27期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

NiFe films were plated in compositions ranging from 55 - 85% Fe using a sulfate-chloride plating bath. The electrical and magnetic properties of these films were studied as a function of iron content. It was determined that films up to magnetic moments of 2.2 T could be obtained with these high iron NiFe alloys. Thin-film heads were made with 1.7 and 2.0 T NiFe materials and tested for magnetic performance. Various experimental parameters were studied for their influence on the film properties.

引用

页码：298 / 306

页数：9

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