Properties of homo- and hetero-Schottky junctions from first principle calculations

被引:5
作者
Greer, James C. [1 ,2 ]
Blom, Anders [3 ]
Ansari, Lida [4 ]
机构
[1] Univ Nottingham Ningbo, New Mat Inst, 199 Taikang East Rd, Ningbo 315100, Zhejiang, Peoples R China
[2] Univ Nottingham Ningbo China, Dept Elect & Elect Engn, 199 Taikang East Rd, Ningbo 315100, Zhejiang, Peoples R China
[3] Synopsys Inc, 690 E Middlefield Rd, Mountain View, CA 94043 USA
[4] Univ Coll Cork, Tyndall Natl Inst, Cork T12 R5CP, Ireland
关键词
ab initio calculations; quantum confinement; Schottky junction; semimetal; electron transport; electronic structure; HETEROEPITAXIAL FILMS; ALPHA-SN; PHOTOEMISSION; CONFINEMENT;
D O I
10.1088/1361-648X/aadbed
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Electronic structure calculations for a homo-material semimetal (thick Sn)/semiconductor (thin Sn) heterodimensional junction and two conventional metal (Ag or Pt)/silicon hetero-material junctions are performed. Charge distributions and local density of states are examined to compare the physics of junctions formed by quantum confinement in a homo-material, heterodimensional semimetal junction with that of conventional Schottky hetero-material junctions. Relative contributions to the Schottky barrier heights are described in terms of the interface dipoles arising due to charge transfer at the interface and the effects of metal induced gap states extending into the semiconducting regions. Although the importance of these physical mechanisms vary for the three junctions, a single framework describing the junction energetics captures the behaviors of both the heterodimensional semimetal junction and the more conventional metal/semiconductor junctions.
引用
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页数:8
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