Thermal emittance of Ag films deposited by magnetron sputtering

被引：16

作者：

Xu, Ke ^{[1
,2
]}

Hao, Lei ^{[1
,2
]}

Du, Miao ^{[1
,2
]}

Mi, Jing ^{[1
,2
]}

Yu, Qinghe ^{[1
,2
]}

Li, Shuai ^{[1
,2
]}

Wang, Jining ^{[1
,2
]}

Li, Shijie ^{[1
,2
]}

机构：

[1] GRINM Grp Co Ltd, Natl Engn Res Ctr Nonferrous Met Mat & Prod New E, Beijing 100088, Peoples R China

[2] GRIMAT Engn Inst Co Ltd, Beijing 101407, Peoples R China

来源：

VACUUM | 2020年 / 174卷

基金：

中国国家自然科学基金;

关键词：

Ag film; Magnetron sputtering; Films thickness; Spectrum reflectance; Thermal emittance; THIN-FILMS; HEIGHT DISTRIBUTION; AGING MECHANISMS; STABILITY; SILVER; SURFACE; TEMPERATURE; REFLECTANCE; EMISSIVITY; ABSORBER;

D O I：

10.1016/j.vacuum.2020.109200

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A series of Ag films were deposited on stainless steel by magnetron sputtering as an infrared reflective layer in solar selective absorbing coating, while their micro-morphologies and phase structure were characterized by SEM and XRD. The effects of different thickness, substrate roughness and deposition temperature on both spectrum reflectance and emittance are investigated. The minimum thermal emittance of 0.6% at 25 degrees C can be obtained with thickness of 120 rim and it is not affected by deposition temperature below 100 degrees C. The spectrum reflectance tends to decrease with an increase of the substrate roughness and deposition temperature. Depositing the TiAlONM/TiAlOND/AlON layer on the optimized Ag film, the emittance of the SSAC at 400 degrees C is only 5.8%, which meets the optical requirements for the IR-reflector.

引用

页数：7

共 30 条

[1]

[Anonymous], [No title captured]

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