Molecular-dynamics simulations of nucleation and growth of crystalline Si films during ELA processes

被引:0
|
作者
Endo, T. [1 ]
Warabisako, T. [1 ]
Munetoh, S.
Motooka, T.
机构
[1] Adv LCD Technol Dev Ctr Co Ltd ALTEDEC, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan
来源
IDW/AD '05: PROCEEDINGS OF THE 12TH INTERNATIONAL DISPLAY WORKSHOPS IN CONJUNCTION WITH ASIA DISPLAY 2005, VOLS 1 AND 2 | 2005年
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Initial stage of the nucleation and growth of crystallizing Si in a rapid cooling process like ELA is discussed by using molecular-dynamics simulations. A new simulation technique is introduced to exclude artificial temperature control and to realize pseudo-natural cooling conditions, which enables us to visualize the behavior of Si atoms under a more natural condition. Based on a statistical analysis of the atomic movements, it is suggested that Si nucleation and growth occur in an amorphous-like or a low-density liquid phase rather than the supercooled liquid as has been generally accepted so far.
引用
收藏
页码:969 / 972
页数:4
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