Symmetry and structure of N-O shallow donor complexes in silicon

被引:3
作者
Alt, H. Ch [1 ]
Wagner, H. E. [1 ]
机构
[1] Munich Univ Appl Sci, Dept Engn Phys, D-80001 Munich, Germany
关键词
Silicon; Nitrogen-oxygen complexes; Shallow donors; FTIR; Piezospectroscopy; NITROGEN-OXYGEN COMPLEXES;
D O I
10.1016/j.physb.2011.08.033
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Shallow donors in silicon related to nitrogen-oxygen complexes have been investigated by piezo-spectroscopy of their hydrogenic transitions in the far infrared. Complete stress dependences up to 0.25 GPa were obtained for the 1s -> 2p(0) and 1s -> 2p(+/-) transitions of the most prominent members of the (N, O)-family, N-O-3 and N-O-5. Very unusual for shallow donors in silicon, the symmetry of the ground state wave function is T-2-like. The lifting of orientational degeneracy for stress in the < 1 0 0 >, < 1 1 1 >, and < 1 1 0 > directions is compatible with a C-2v defect symmetry. Data from the other species of the (N, O)-family are indicative for the same symmetry. The microscopic structure of these centers, in part contradictory to present theoretical models, is discussed. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2985 / 2988
页数:4
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