Laser-assisted atom probe tomography and nanosciences

被引:20
作者
Blavette, Didier
Al Kassab, Talaat [2 ]
Cadel, Emanuel
Mackel, Alexander [2 ]
Vurpillot, Francois
Gilbert, Mathieu
Cojocaru, Oana
Deconihout, Bernard [1 ]
机构
[1] Univ Rouen, CNRS, UMR 6634, GPM, F-76801 St Etienne, France
[2] Inst Mat Phys, Gottingen, Germany
关键词
laser assisted 3D atom probe; nano-analysis; nanocontacts; silicides; tunnel junctions;
D O I
10.3139/146.101672
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
A laser assisted tomographic atom probe has recently been designed. The use of femtosecond laser evaporation pulses rather than of high-voltage pulses has opened the field of application of the technique to new materials such as semiconductors and oxides. These classes of materials are of utmost importance in microelectronics for the design of nanochips and nano-transistors in integrated devices. This type of instrument is the only 3D analytical microscope capable of mapping out the distribution of elements in a small volume (50 x 50 x 100 nm(3)) on a nearly atomic scale. In addition, the tomographic atom probe enables us to get quantitative composition measurements. This review illustrates the potential of this new instrument (laser assisted wide angle tomographic atom probe LaWaTAP) when applied to study scientific topics in nano-sciences. As an example, both the distribution of addition elements (Pt) during inter-diffusive reaction in NiSi contacts of nano-transistors and the investigation of interfaces in MgO/Fe tunnel junctions are presented and discussed.
引用
收藏
页码:454 / 460
页数:7
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