Ultrafast carrier dynamics in BiVO4 thin film photoanode material: interplay between free carriers, trapped carriers and low-frequency lattice vibrations

被引:69
作者
Butler, K. T. [1 ]
Dringoli, B. J. [2 ]
Zhou, L. [3 ,4 ]
Rao, P. M. [3 ,4 ]
Walsh, A. [5 ]
Titov, L. V. [2 ]
机构
[1] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England
[2] Worcester Polytech Inst, Dept Phys, Worcester, MA 01609 USA
[3] Worcester Polytech Inst, Dept Mech Engn, Worcester, MA 01609 USA
[4] Worcester Polytech Inst, Mat Sci & Engn Grad Program, Worcester, MA 01609 USA
[5] Imperial Coll London, Dept Mat, London SW7 2AZ, England
基金
美国国家科学基金会; 英国工程与自然科学研究理事会;
关键词
RESOLVED TERAHERTZ SPECTROSCOPY; BISMUTH VANADATE; CHARGE SEPARATION; METAL-OXIDE; TRANSPORT; ABSORPTION; SEMICONDUCTORS; TRANSITION; DIFFUSION; MOBILITY;
D O I
10.1039/c6ta07177e
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We explore ultrafast carrier dynamics and interactions of photoexcited carriers with lattice vibrational modes in BiVO4 photoanode material using time-resolved terahertz spectroscopy and first-principles phonon spectrum calculations. We find that photoexcited holes form bound polaron states by introducing lattice distortion that changes phonon spectrum and suppresses the A(g) phonon mode associated with opposite motion of Bi and VO4 molecular units. At excitation fluence higher than 1 mJ cm(-2) (or 2 x 10(15) cm(-2) per pulse), lattice distortion due to self-localized holes alters the lattice symmetry and vibrational spectrum, resulting in bleaching of THz absorption by A(g) phonons. Concurrently, we observe a short lived population of free carriers which exhibit Drude conductivity with mobility on the order of 200 cm(2) V-1 s(-1), orders of magnitude higher than typical carrier mobility in BiVO4. The anomalously high carrier mobilities are explained in the framework of a Mott transition. This demonstration of enhanced transport suggests how engineering BiVO4 photoanodes to take advantage of free carrier transport under high excitation conditions may in the future significantly enhance performance of photoelectrochemical devices.
引用
收藏
页码:18516 / 18523
页数:8
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