Intrinsic band gap shift in Ti silicalites modified by V ion implantation: Ab initio and density functional theory study

被引:3
作者
Zhanpeisov, NU [1 ]
Kanazawa, Y [1 ]
Yamashita, H [1 ]
Anpo, M [1 ]
机构
[1] Osaka Prefecture Univ, Dept Appl Chem, Osaka 5998531, Japan
关键词
Ti silicalite; V ion implantation; ab initio; DFT; band gap; excitation shift;
D O I
10.1002/qua.10729
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ab initio and density functional theory quantum chemical calculations show that both the tetrahedrally coordinated V ions and highly dispersed titanium oxide species in the V ion-implanted Ti silicalites have the tendency to locate in next-neighboring positions via the formation of a Ti-O-V linkage. The latter was found to play an important role in modifying the electronic nature of the Ti silicalite photocatalysts to enable the absorption band to shift to longer wavelength regions. (C) 2003 Wiley Periodicals, Inc.
引用
收藏
页码:349 / 354
页数:6
相关论文
共 17 条
[1]  
Anpo M., 1997, CATAL SURV JPN, V1, P169
[2]  
ANPO M, 1999, SURF SCI JPN, V20, P60
[3]  
ANPO M, 2000, PHOTOFUNCTIONAL ZEOL
[4]   On the structure and coordination of the oxygen-donating species in Ti↑MCM-41/TBHP oxidation catalysts:: a density functional theory and EXAFS study [J].
Barker, CM ;
Gleeson, D ;
Kaltsoyannis, N ;
Catlow, CRA ;
Sankar, G ;
Thomas, JM .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2002, 4 (07) :1228-1240
[5]   DENSITY-FUNCTIONAL EXCHANGE-ENERGY APPROXIMATION WITH CORRECT ASYMPTOTIC-BEHAVIOR [J].
BECKE, AD .
PHYSICAL REVIEW A, 1988, 38 (06) :3098-3100
[6]   HETEROGENEOUS PHOTOCATALYSIS [J].
FOX, MA ;
DULAY, MT .
CHEMICAL REVIEWS, 1993, 93 (01) :341-357
[7]  
Frisch M.J., 1995, GAUSSIAN 94 REVISION
[8]  
HAY PJ, 1985, J CHEM PHYS, V82, P299, DOI [10.1063/1.448800, 10.1063/1.448799]
[9]   PHOTOCHEMISTRY ON NONREACTIVE AND REACTIVE (SEMICONDUCTOR) SURFACES [J].
KAMAT, PV .
CHEMICAL REVIEWS, 1993, 93 (01) :267-300
[10]  
KANAZAWA Y, UNPUB CHEM LETT