Buffer-enhanced room-temperature growth and characterization of epitaxial ZnO thin films

被引:73
作者
Sasaki, A
Matsuda, WHA
Tateda, N
Otaka, S
Akiba, S
Saito, K
Yodo, T
Yoshimoto, M
机构
[1] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan
[2] Bruker AXS KK, Kanagawa Ku, Yokohama, Kanagawa 2210022, Japan
[3] Osaka Inst Technol, Asahi Ku, Osaka 5358585, Japan
[4] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
D O I
10.1063/1.1947378
中图分类号
O59 [应用物理学];
学科分类号
摘要
The room-temperature epitaxial growth of ZnO thin films on NiO buffered sapphire (0001) substrate was achieved by using the laser molecular-beam-epitaxy method. The obtained ZnO films had the ultrasmooth surface reflecting the nanostepped structure of the sapphire substrate. The crystal structure at the surface was investigated in situ by means of coaxial impact-collision ion scattering spectroscopy. It was proved that the buffer-enhanced epitaxial ZnO thin films grown at room temperature had +c polarity, while the polarity of high-temperature grown ZnO thin films on the sapphire was -c. Photoluminescence spectra at room temperature were measured for the epitaxial ZnO films, showing only the strong ultraviolet emission near 380 nm. (c) 2005 American Institute Of Physics.
引用
收藏
页码:1 / 3
页数:3
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