Demonstration of InGaN Light-Emitting Diodes by Incorporating a Self-Textured Oxide Mask Structure

被引:4
|
作者
Lin, Wen-Yu [1 ]
Wuu, Dong-Sing [1 ]
Huang, Shih-Cheng [1 ]
Lo, Shih-Yung [1 ]
Liu, Chien-Min [1 ]
Horng, Ray-Hua [2 ,3 ]
机构
[1] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 40227, Taiwan
[2] Natl Cheng Kung Univ, Dept Electroopt Engn, Tainan 70101, Taiwan
[3] Natl Chung Hsing Univ, Inst Precis Engn, Taichung 40227, Taiwan
关键词
Fabry-Perot; InGaN; light-emitting diode (LED); oxide; WET ETCHING PROCESS; EFFICIENCY;
D O I
10.1109/LPT.2011.2158992
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 460-nm InGaN light-emitting diode (LED) with a self-textured oxide mask (STOM) array structure upon an additional low-temperature GaN interlayer is demonstrated. As compared with a conventional LED, the electroluminescence (EL) spectrum of an STOM-LED displays a manifest peak profile without Fabry-Perot interference fringes, one-fold increment in EL intensity, and 43% enhancement in total output power at an injection current of 20 mA. High-density light-emitting dots across the STOM-LED surface are discovered at a small injection current of 20 A because the STOM array can act as scattering centers to enhance the light extraction.
引用
收藏
页码:1240 / 1242
页数:3
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