Molecular dynamics investigation of temperature dependent structural and fracture properties of amorphous silicon nitride

被引：4

作者：

Liao, N. B. ^{[1
]}

Xue, W. ^{[1
]}

Zhang, M. ^{[1
]}

机构：

[1] Wenzhou Univ, Coll Mech & Elect Engn, Wenzhou 325035, Peoples R China

来源：

MATERIALS SCIENCE AND TECHNOLOGY | 2011年 / 27卷 / 12期

基金：

中国国家自然科学基金;

关键词：

Silicon nitride; Molecular dynamics; Mechanical properties; Amorphous structure; MECHANICAL-PROPERTIES; ATOMIC-STRUCTURE; PRESSURE; STRENGTH; SIMULATIONS; BEHAVIOR; RANGE; SI3N4;

D O I：

10.1179/1743284711Y.0000000003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Silicon nitride presents good mechanical properties and thermal stability at high temperature. As the experiments have limitations in the micro-/nanoscale characterisation of structural and fracture properties at high temperatures, atomistic simulation is the proper way to investigate the mechanism of this unique feature. In the present paper, the structural and fracture properties of amorphous silicon nitride (a-Si3N4) were studied at temperatures up to 1500 K. The simulation results consist of experiments on radial distribution function, temperature dependent yield stress and Young's modulus. Based on the structural and mechanical results of alpha-Si3N4 at different temperatures, the structure-property correlations were discussed.

引用

页码：1798 / 1801

页数：4

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